The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2001
Filed:
Oct. 06, 2000
Applicant:
Inventor:
Wei-Ray Lin, Taipei, TW;
Assignee:
Nanya Technology Corporation, Taoyuan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/18242 ; H01L 2/14763 ;
U.S. Cl.
CPC ...
H01L 2/18242 ; H01L 2/14763 ;
Abstract
A method divides the formation of the contact plug connecting a source/drain region in the peripheral circuit area into two steps, wherein the capacitor can be fabricated at the same time so as to save one mask. Besides, at each step of forming the contact plug with low aspect ratio, a CVD method is utilized to uniformly deposited a barrier layer on the contact window and completely fill the contact window. This can thoroughly eliminate the defects found in the prior art. Consequently, the simplified process can reduce the manufacturing period time and the production cost.