The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2001
Filed:
Dec. 23, 1998
Applicant:
Inventors:
Jacob Daniel Haskell, Palo Alto, CA (US);
Rong Hsu, Cupertino, CA (US);
Assignee:
Aurora Systems, Inc., San Jose, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/12 ;
U.S. Cl.
CPC ...
G02B 6/12 ;
Abstract
A planar wafer based device (e.g., a reflective light valve backplane) includes a substrate having a plurality of surface projections (e.g., pixel mirrors) defining gaps therebetween, an etch-resistant layer formed on the substrate, and a fill layer formed on a portion of the etch-resistant layer in the gaps. In a particular embodiment, the fill layer is a spin-on coating. An optional protective layer formed on the exposed portions of the etch-resistant layer and the fill layer protects the underlying layers during subsequent processing steps.