The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2001
Filed:
Feb. 09, 1999
Godefridus A. M. Hurkx, Eindhoven, NL;
Holger Schligtenhorst, Eindhoven, NL;
Bernd Sievers, Hamburg, DE;
U.S. Philips Corporation, New York, NY (US);
Abstract
The invention relates to a semiconductor device including a preferably discrete bipolar transistor with a collector region, a base region, and an emitter region which are provided with connection conductors. A known means of preventing a saturation of the transistor is that the latter is provided with a Schottky clamping diode. The latter is formed in that case in that the connection conductor of the base region is also put into contact with the collector region. In a device according to the invention, the second connection conductor is exclusively connected to the base region, and a partial region of that portion of the base region which lies outside the emitter region, as seen in projection, lying below the second connection conductor is given a smaller flux of dopant atoms. The bipolar transistor in a device according to the invention is provided with a pn clamping diode which is formed between the partial region and the collector region. Such a device has excellent properties, such as a short switching time and a saturation collector-emitter voltage which is not too high, while having a low, non-variable and well reproducible leakage current, unlike the known device. The reduced flux of dopant atoms of the partial region is preferably realized in that the partial region is given a smaller doping concentration and/or thickness than the remainder of the portion of the base region which lies outside the emitter region. In a favorable modification, a region provided simultaneously with the emitter region is present between the partial region and the second connection conductor.