The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2001
Filed:
Apr. 27, 1998
Applicant:
Inventor:
Yasuhisa Yamada, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A partial collective mask for charged particle beam exposure of the present invention is capable of being easily reshaped in order to obviate snapping, defective contact draw and other critical faults. The mask is formed not only with openings constituting main patterns or device patterns, but also with openings constituting auxiliary patterns. When any one of the main patterns has a size short of a designed size and is apt to bring about snapping or similar critical fault, such a defective pattern and the auxiliary patterns adjoining it are jointed together so as to correct the size.