The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2001
Filed:
Dec. 08, 1999
Sergei Putvinski, La Jolla, CA (US);
Tihiro Ohkawa, La Jolla, CA (US);
Richard L. Freeman, Del Mar, CA (US);
Archimedes Technology Group, Inc., San Diego, CA (US);
Abstract
A plasma mass filter using a helical magnetic field for separating low-mass particles from high-mass particles in a multi-species plasma includes a cylindrical outer wall located at a distance “a” from a longitudinal axis. Also included is a coaxial cylindrical inner wall positioned to establish a plasma chamber between the inner and outer walls. The magnetic field is generated in this chamber with an axial component (B,) and an azimuthal component (B,), which interact together with an electric field to create crossed magnetic and electric fields. The electric field has a positive potential, V,, on the inner wall and a zero potential on the outer wall. With these crossed magnetic and electric fields, a multi-species plasma is moved through the chamber with a velocity, v,, high-mass particles in the plasma (M,) are ejected into the outer wall and low-mass particles (M,) are confined in the chamber during transit of the chamber to separate the low-mass particles from the high-mass particles, where M,<M,<M,, and where M,=(ea,(B,+B,)/8v){f(B,/B)}.