The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2001
Filed:
Dec. 09, 1999
Wolfgang Dultz, Frankfurt am Main, DE;
Erna Frins, Montevideo, UY;
Bernd Hils, Koenigstein, DE;
Heidrun Schmitzer, Regensberg, DE;
Deutsche Telekom AG, Bonn, DE;
Abstract
A double-beam interferometer for electromagnetic radiation and a method for the compensation of dispersion or increase in the spectral resolution of such an interferometer. Using a polarizer, which is brought into the optical radiation path, a defined polarization state P,is produced for the electromagnetic partial waves flowing into the arms of the interferometer. This polarization state is wavelength-independent and can vary for both partial beams. Optical elements modify the polarization state P,of the electromagnetic partial waves as a function of wavelength &lgr; and each spectral component &lgr;,is coded with a polarization P,(&lgr;i). An analyzer, fitted to the output of the interferometer, transmits an adjustable polarization state P,, whereby an additional wavelength-dependent phase difference &ggr;(&lgr;) occurs between the partial waves of the spectral components. &ggr;(&lgr;) can be adjusted to obtain compensation of dispersion or an increase in the spectral resolution of the interferometer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile