The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2001
Filed:
Mar. 24, 1999
Applicant:
Inventors:
Ronald G. Koelsch, Roscommon, MI (US);
Robert Koelsch, Scottsdale, AZ (US);
Assignee:
Wafer Standards, Inc., Tempe, AZ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01R 1/04 ; H01L 2/131 ;
U.S. Cl.
CPC ...
G01R 1/04 ; H01L 2/131 ;
Abstract
A stabilized wafer for monitoring and calibrating oxide charge test equipment. The stabilized wafer comprises; a silicon wafer, a SiO,layer of at least 100 angstroms upon the silicon wafer, and a phosphosilicate glass layer containing phosphorus formed in the SiO,layer for providing the stabilized wafer by stabilizing an SiO,interface and containing oxygen ions. The stabilized wafer is used for monitoring and calibrating oxide charge test equipment.
Koelsch, Ronald. (2001). Device for monitoring and calibrating oxide charge measurement equipment and method therefor (U.S. Patent No. 6249117). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6249117
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile