The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2001
Filed:
Feb. 03, 1999
Yoshimi Shiramizu, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
A method of analyzing substances is provided, which improves the correctness in analysis of desired substances applying some bad effect to a semiconductor device. In the first step, a gas to be analyzed is contacted with an absorbent, thereby absorbing substances existing in the gas to the absorbent. The absorbent is made of a same material as that of a semiconductor material to be processed in the gas. In the second step, the absorbent is heated to thermally desorb the absorbed substances from the absorbent at a specific thermally desorbing temperature. In the third step, the desorbed substances are physically separated to be identified by using an analytical system. Preferably, the absorbent used in the first step is made of bits or particles of polycrystalline, single-crystal, or amorphous Si. The absorbent is preferably located in a hollow refractory tube and the gas is injected into the tube in the first step.