The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2001
Filed:
Mar. 12, 1999
Applicant:
Inventors:
Christopher David McCullough, Leeds West Yorkshire, GB;
Kevin Barry Ray, Morley, GB;
Assignee:
Kodak Polychrome Graphics, LLC, Norwalk, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/30 ; G03F 7/021 ;
U.S. Cl.
CPC ...
G03F 7/30 ; G03F 7/021 ;
Abstract
A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask, comprises the patternwise exposure to suitable radiation of a composition which comprises a novolac resin and a diazonium salt. The composition is rendered preferentially soluble to a developer in the regions which were exposed.