The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2001
Filed:
Jul. 19, 1999
John David Cuthbert, Orlando, FL (US);
Lucent Technologies Inc., Murray Hill, NJ (US);
Abstract
A method and controller for controlling a process and system for patterning a feature in a photoresist on a semiconductor wafer. The present invention characterizes various components (both individually and collectively) of an image transfer system, including the illumination source, lens and product reticle, with regard to dimensional errors introduced into the image transfer process by these components. The collective error data or information provided in accordance with the present invention may be communicated to the image transfer system to control the image transfer system and the image transfer process and to ensure that the actual dimension of features patterned in the photoresist are within acceptable dimensional limits for these features.