The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 2001

Filed:

Jan. 20, 1999
Applicant:
Inventors:

Hiroshi Shibano, Ohtsu, JP;

Yoshihiro Kasho, Ohtsu, JP;

Kazuo Takahashi, Ohtsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D 3/02 ;
U.S. Cl.
CPC ...
G03D 3/02 ;
Abstract

There is disclosed a system for developing photosensitive resin plates with an aqueous developing solution and for disposing of a waste developing solution. In the system, a fresh developing solution is added to a developing unit in a continuous manner or at intervals of a fixed period, while a part of the resin-containing developing solution is removed from the developing unit, whereby the resin content of the developing solution in the developing unit is kept substantially constant and the disposal of the waste developing solution is carried out in parallel with the development. Also disclosed herein are apparatus used in the developing system.


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