The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2001
Filed:
Nov. 08, 1999
Applicant:
Inventors:
Assignee:
N.V. Michel Van de Wiele, Kortrijk/Marke, BE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
D03D 2/706 ;
U.S. Cl.
CPC ...
D03D 2/706 ;
Abstract
Method for manufacturing a fabric with a rib structure, in particular a false bouclé fabric, whereby a backing fabric is woven out of binding warp threads (,), (,) and weft threads (,), (,), whereby pattern warp threads (,), (,) are alternately interlaced in the backing fabric and along one side of the backing fabric are rib-formingly passed around at least one weft thread (,) running outside the backing fabric. A fabric is thus obtained with a rib structure on only one side. Because of this the consumption of pattern warp yarn can be reduced.
Quick Actions:
Debaes, Johnny. (2001). Method for manufacturing a fabric with rib structure, and fabrics manufactured according to this method (U.S. Patent No. 6247506). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6247506
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile