The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 2001

Filed:

Feb. 18, 1997
Applicant:
Inventors:

Chun-Yuan Lee, Chiang-Fu Hsien, TW;

Ping Ping Tsai, Chutung, TW;

Chia-Jung Lu, Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 9/36 ;
U.S. Cl.
CPC ...
G01N 9/36 ;
Abstract

A porous poly(2-acryl-amido-2-methyl-propane sulphonic acid)-based humidity sensing element is disclosed which provides improved range of humidity measurement and response time with little or no hysteresis. It includes: (a) a non-conductive substrate which has a pair of electrodes formed thereon; (b) a porous poly(2-acryl-amido-2-methyl-propane sulphonic acid) film formed on said electrodes. The porous poly(2-acryl-amido-2-methyl-propane sulphonic acid) film is formed by first forming a non-porous poly(2-acryl-amido-2-methyl-propane sulphonic acid) film on the electrodes, then subjecting the non-porous poly(2-acryl-amido-2-methyl-propane sulphonic acid) film to a heat treatment at temperatures between about 170° C. and 240° C. such that a porous structure is formed in said poly(2-acryl-amido-2-methyl-propane sulphonic acid) film. The poly(2-acryl-amido-2-methyl-propane sulphonic acid) can be modified by incorporating a cation, such as hydrogen, lithium, potassium, sodium, ammonium, primary, secondary, and tertiary amine ions, and tetra-alkyl ammonium ions.


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