The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2001
Filed:
Oct. 25, 1999
Applicant:
Inventors:
Chwung-Shan Kou, Hsinchu, TW;
Tsang-Jiuh Wu, Hsinchu, TW;
Assignee:
National Science Council, Taipei, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 7/24 ; H05B 3/126 ;
U.S. Cl.
CPC ...
H01J 7/24 ; H05B 3/126 ;
Abstract
A plasma generator is composed of a surface wave resonant cavity and a vacuum cavity. A microwave energy is introduced into the surface wave resonant cavity via a couple hole of the surface wave resonant cavity, thereby causing the surface wave resonant cavity to resonate to bring about an electromagnetic surface wave, which is then guided into the vacuum cavity via a large area quartz or ceramic couple window located at the top of the vacuum cavity, so as to result in the production of a large area planarized plasma by a low pressure gas contained in the vacuum cavity.