The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 2001

Filed:

Feb. 26, 1998
Applicant:
Inventors:

Takeshi Fukui, Suita, JP;

Hidetoshi Furukawa, Suita, JP;

Daisuke Ueda, Ibaraki, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1265 ;
U.S. Cl.
CPC ...
H01L 2/1265 ;
Abstract

A resistive area,is formed selectively on a semi-insulating substrate,and ohmic electrodes,are formed on both ends of the resistive area. Then a photo resist,having an opening,between the electrodes,is so formed as not completely across the resistive area,A desirable resistance value is thus obtained by removing the resistance area,by etching through the opening,gradually.


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