The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2001
Filed:
Jun. 21, 1999
Applicant:
Inventors:
Zhaosheng Tan, Troy, MI (US);
Krishna Sapru, Troy, MI (US);
Assignee:
Energy Conversion Devices, Inc., Troy, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 6/00 ; H01J 3/730 ; H05F 3/00 ;
U.S. Cl.
CPC ...
H05B 6/00 ; H01J 3/730 ; H05F 3/00 ;
Abstract
A method and apparatus for forming polycrystalline particles by gas phase condensation employing arc plasma evaporation. The disclosed method and apparatus may be employed to form polycrystalline particles from high-melting temperature, low evaporation pressure materials such as transition metals. Arc discharge is sustained by the evaporated species, therefore, there is no need for a plasma sustaining gas. Evaporation may be sustained from either the cathode or anode. A reaction gas may be provided to form products with the evaporated species.