The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 12, 2001

Filed:

Aug. 27, 1998
Applicant:
Inventors:

Go Kashio, Aichi, JP;

Akira Iwamura, Aichi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23P 1/300 ; B21D 3/104 ; H01M 4/74 ;
U.S. Cl.
CPC ...
B23P 1/300 ; B21D 3/104 ; H01M 4/74 ;
Abstract

A manufacturing method for an expanded grid includes the steps of: (a) supplying a thin plate of band form from the longitudinal direction, (b) forming a plurality of intermittent cuts parallel to the edge in a first region, excluding the central portion, of the thin plate of band form, (c) bending the central portion at a desired angle, and (d) expanding and developing the cuts in the width direction, while moving sequentially in the longitudinal direction the thin plate having the first region forming the plurality of cuts and the central portion not having the cuts, in which the first track distance of the outermost side portion of the first region having the cuts developed and formed is nearly the same distance as the track distance of the central portion. The plane distortion of the grid is eliminated, the width dimension of the grid is stable, and the quality of the electrode plate using such grid is enhanced. Further, local stress concentration of the grid is suppressed.


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