The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2001
Filed:
Sep. 08, 1994
Applicant:
Inventors:
Kevin F. McCarty, Livermore, CA (US);
Robert J. Kee, Livermore, CA (US);
Andrew E. Lutz, Alamo, CA (US);
Ellen Meeks, Livermore, CA (US);
Assignee:
Sandia Corporation, Livermore, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/08 ;
U.S. Cl.
CPC ...
B05D 1/08 ;
Abstract
The present invention employs a constrained stagnation flow geometry apparatus to achieve the uniform deposition of materials or heat. The present invention maximizes uniform fluxes of reactant gases to flat surfaces while minimizing the use of reagents and finite dimension edge effects. This results, among other things, in large area continuous films that are uniform in thickness, composition and structure which is important in chemical vapor deposition processes such as would be used for the fabrication of semiconductors.