The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2001
Filed:
May. 22, 1998
Applicant:
Inventors:
Jin Jang, Jamwon-dong, Seocho-ku, Seoul, KR;
Soo-Young Yoon, Daejeon, KR;
Jae-Young Oh, Jeju-shi, KR;
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 1/06 ;
U.S. Cl.
CPC ...
C30B 1/06 ;
Abstract
A method for crystallizing an amorphous layer into a polycrystalline layer. The method uses a substrate under the amorphous layer and a nickel film on the amorphous layer, which are subjected to a heat treatment. The nickel film is formed by a coating step that uses a nickel-containing solution. Alternatively, a nickel and gold, or a nickel and palladium, solution can be used. The method eliminates contamination with metal in the polycrystalline silicon layer and reduces its growth temperature.