The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2001
Filed:
Feb. 16, 1999
Tetsuya Oshino, Kawasaki, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An X-ray projection exposure apparatus has at least an X-ray source, an X-ray illumination optical system which directs X-rays generated by the X-ray source onto a mask having a prescribed pattern, an X-ray projection focusing optical system which receives X-rays from the mask and projects and focuses an image of the pattern on a substrate. The X-ray projection exposure apparatus further has a mask stage which holds the mask, a substrate stage which holds the substrate, and a position detection optical system which optically detects marks on the mask and substrate. In the X-ray projection exposure apparatus, the projection focusing optical system includes a plurality of reflective mirrors that reflect the X-rays, and at least a portion of the position detection optical system is disposed among the plurality of reflective mirrors.