The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2001
Filed:
Jul. 08, 1999
Applicant:
Inventors:
Gisbert Michels, Cologne, DE;
Bernd Klinksiek, Bergisch-Gladbach, DE;
Otto Schmid, Leverkusen, DE;
Ralph Ostarek, Longmeadow, MA (US);
Richard Weider, Longmeadow, MA (US);
Raymond D. Burk, Wilbraham, MA (US);
Joong-In Kim, Amherst, MA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/502 ;
U.S. Cl.
CPC ...
C08F 2/502 ;
Abstract
A continuous process for the manufacture of impact resistant polymers is disclosed. The process comprise polymerization of a reaction mixture containing vinylaromatic monomers in the presence of soluble rubber and entails shearing at least some of said mixture at a rate of more than 30000 1/s using a device having no rotating parts. The resulting product is characterized in its low gloss and improved impact properties.