The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 29, 2001

Filed:

May. 23, 1996
Applicant:
Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 5/12 ;
U.S. Cl.
CPC ...
B05D 5/12 ;
Abstract

Metal patterns (,″) can be provided on a glass substrate (,) in an electroless process by modifying the substrate with a silane monolayer (,), nucleating said momolayer with a polymer-stabilized Pd sol (,) and, subsequently, locally removing the Pd nuclei and silane layer (,′) with a pulsed laser. Neither a photoresist nor organic solvents are used. The method can very suitably be used for the manufacture of the black matrix on a faceplate of display devices, such as the passive plate for an LCD.


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