The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2001
Filed:
Apr. 21, 2000
Applicant:
Inventors:
Ajay K. Garg, Northborough, MA (US);
Brahmanandam V. Tanikella, Natick, MA (US);
Arup Khaund, Northborough, MA (US);
Assignee:
Saint-Gobain Industrial Ceramics, Inc., Worchester, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 3/550 ;
U.S. Cl.
CPC ...
C04B 3/550 ;
Abstract
A polishing slurry, useful in optical or CMP applications, comprises a ceria with a BET surface area of at least 10 m,/gm. The slurry may be made by subjecting a commercial ceria slurry comprising agglomerates to a mechano-chemical treatment at a pH of from 9 to 11 using media that are low purity alpha alumina or zirconia. Preferred slurries maintain a positive surface charge at all pH values. CMP slurries preferably comprise in addition an anionic surfactant to aid in removal of surface residues.