The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 29, 2001

Filed:

Mar. 03, 2000
Applicant:
Inventor:

Robert G. Spahn, Webster, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/400 ;
U.S. Cl.
CPC ...
C23C 1/400 ;
Abstract

A thermal physical vapor deposition electroluminescent source includes a housing defining an enclosure having side walls and a bottom wall, the enclosure receiving solid organic electroluminescent material which can be vaporized, and the width of the housing having a dimension w,; and the housing has a conductive portion defining a vapor efflux aperture slit having a width w,for permitting vaporized electroluminescent materials to pass through the slit onto a surface of a substrate. A conductive baffle member has width b, the baffle member being centered on the slit and spaced from the side walls and spaced from the top plate by a distance m, the baffle member substantially providing a line-of-sight covering of the slit preventing direct access of vaporized electroluminescent materials to the slit, and preventing particulate electroluminescent materials from passing through the slit; and a straight-line projection from an edge of the slit to an edge of the baffle member onto a side wall defining a position on the side wall such that such position is spaced from the top plate by a dimension L. The ratio of the dimensions w,to w,is in a range of from 1.5 to 6.0; the ratio of L to w,is in a range of from 2 to 6; and the ratio of m to L is in a range of from 0.15 to 0.40. Heat is applied to different parts of the housing to cause vapor deposition.


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