The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2001
Filed:
Apr. 23, 1999
Ronald L. Meyer, Plano, TX (US);
Ramaiah Velidi, Dallas, TX (US);
Raytheon Company, Lexington, MA (US);
Abstract
Dynamic antenna pattern modification is accomplished with multi-element, multi-column antennas having the radiation pattern controlled dynamically based on the number of users serviced by the sectors of a multi-sector base station. The number of users is determined either directly through information available from the base station, or indirectly by monitoring the system load (number of users). Sectors of the cell servicing fewer users are expanded to accommodate users from portions of an adjacent sector, in the same cell, by modification of the antenna coverage patterns in each sector. The antenna pattern for a sector serving a relatively large number of users, for a given cell radius, would contract in azimuth for both transmit and receive functions and decrease both transmitted output power and received signal sensitivity. Simultaneously, antenna coverage patterns in the adjacent sector (in the same cell) would expand in azimuth to provide the same cell radius, coverage and performance level as prior to the pattern modification.