The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2001
Filed:
Aug. 27, 1998
Yuichi Yamada, Utsunomiya, JP;
Atsushi Kawahara, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure method for exposing a surface to be exposed via a projection optical system after a substrate moves stepwise in a direction perpendicular to an optical axis of the projection optical system to feed to a predetermined exposure position a plurality of shots on the substrate, in turn, in which at least one of a position and tilt of the surface to be exposed of a fed shot to be exposed in the direction of the optical axis is measured during the stepwise movement, and the surface to be exposed is brought to a position of a focal plane of the projection optical system on the basis of a measurement value. The method includes a step of obtaining, in advance, a focus offset as a measurement error resulting from different measurement points for the measurement during the stepwise movement and a deformation of a main body structure, in each shot, and a step of bringing the surface to be exposed for the shot to be exposed to the position of the focal plane on the basis of a correction result of the measurement, in each shot to be exposed, using the focus offset, in an exposure sequence.