The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2001
Filed:
Sep. 28, 1998
Shmaryu M. Shvartsman, Mayfield Heights, OH (US);
Robert W. Brown, Solon, OH (US);
Hiroyuki Fujita, Highland Heights, OH (US);
Michael A. Morich, Mentor, OH (US);
Labros S. Petropoulos, Solon, OH (US);
Other;
Abstract
Methods of designing an active shield for substantially zeroing an electro-magnetic field on one side of a predetermined boundary in open magnetic resonance imaging systems and in open electric systems are provided. The methods include defining a finite length geometry for a primary structure which, in the case of zeroing a magnetic field, carries a first current distribution on its surface. A finite length geometry is also defined for a secondary structure which, in the case of zeroing a magnetic field, carries a second current distribution on its surface. In the case of zeroing an electric field, the current distributions are replaced with charge distributions. A total magnetic or electric field resulting from a combination of the first and second current or charge distributions respectively is constrained such that normal components (in the magnetic field case) or tangential components (in the electric field case) thereof substantially vanish at the surface of one of the primary and secondary structures. The first current or charge distribution is constrained to the surface of the primary structure, and the second current or charge distribution is constrained to the surface of the secondary structure. The first and second current or charge distributions are then calculated concurrently allowing both the first and second current or charge distributions to vary while observing the constraints such that a predetermined magnetic or electric field is achieved in a first region and a magnetic or electric field on one side of a predetermined boundary is substantially zeroed.