The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2001
Filed:
May. 12, 1999
Douglas A. Loy, Albuquerque, NM (US);
Kamyar Rahimian, Albuquerque, NM (US);
Sandia Corporation, Albuquerque, NM (US);
Abstract
Cross-linked polymers formed by ring-opening polymerization of a precursor monomer of the general formula R[CH,CH(Si(CH,),),O],, where R is a phenyl group or an alkyl group having at least two carbon atoms. A cross-linked polymer is synthesized by mixing the monomer with a co-monomer of the general formula CH,CHR,(SiMe,),O in the presence of an anionic base to form a cross-linked polymer of recurring units of the general formula R(Me,SiOCH,CHSiMe,),[CH,CHR,(SiMe,),O],, where R,is hydrogen, phenyl, ethyl, propyl or butyl. If the precursor monomer is a liquid, the polymer can be directly synthesized in the presence of an anionic base to a cross-linked polymer containing recurring units of the general formula R(Me,SiOCH,CHSiMe,),. The polymers have approximately less than 1% porosity and are thermally stable at temperatures up to approximately 500° C. The conversion to the cross-linked polymer occurs by ring opening polymerization and results in shrinkage of less than approximately 5% by volume.