The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 2001
Filed:
Feb. 26, 1999
Applicant:
Inventors:
Yasuaki Tsuchiya, Tokyo, JP;
Mieko Suzuki, Tokyo, JP;
Assignee:
NEC Corporation, , JP;
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/14 ; C09G 1/02 ; C09G 1/04 ; H01L 2/1304 ;
U.S. Cl.
CPC ...
C09K 3/14 ; C09G 1/02 ; C09G 1/04 ; H01L 2/1304 ;
Abstract
The present invention provides a chemical mechanical polishing method for polishing a soft metal by supplying a polishing surface of the soft metal with a novel polishing slurry which includes at least both alumina particles as polishing particles and hydrogen peroxide as oxidizing agent, wherein the content of the alumina particles is in the range of 2-10% by weight of the total amount of the polishing slurry.