The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 22, 2001

Filed:

Dec. 21, 1998
Applicant:
Inventor:

James S. Shaw, Hampton Falls, NH (US);

Assignee:

General Electric Company, Cincinnati, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 1/00 ;
U.S. Cl.
CPC ...
B24B 1/00 ;
Abstract

A free flow abrasive hole polishing system and method improves air flow and resultant component cooling efficiency for an apertured article. The free flow abrasive hole polishing system mixes an abrasive particle component with a carrier media to create a free flowing abrasive particle carrier media mixture. This mixture is pumped through apertures defined by aperture walls in the article to improve air flow and resultant cooling efficiency of the article. Since the abrasive particles have mass and velocity and the free flowing media does not have resistance to flow, the abrasive particles impinge on peaks of the aperture walls, predominantly removing high spots in the aperture walls.


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