The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2001
Filed:
Feb. 20, 1998
Yoshihiko Ishitaka, Miyagi-ken, JP;
Alps Electric Co. Ltd., Tokyo, JP;
Abstract
A method for producing a reflector has: a step for applying a photosensitive resin onto a base member to form a photosensitive-resin layer; a step for pressing a mold, having a fine uneven pattern on the surface thereof, to the photosensitive-resin layer so as to transfer the shape of the fine uneven pattern to the photosensitive-resin layer; a step for curing the photosensitive-resin layer by radiating a light beam to the photosensitive-resin layer while pressing the mold to the photosensitive-resin layer; a step for removing the mold from the cured photosensitive-resin layer; and a step for forming a metallic reflective film on the fine uneven pattern transferred to the surface of the cured photosensitive-resin layer. Since the fine uneven pattern is formed on the photosensitive-resin layer by pressing the mold thereto and is covered with the metallic reflective film, a reflection face of the resulting reflector can obtain the shape of the fine uneven pattern transferred from the mold.