The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 2001

Filed:

Nov. 09, 1999
Applicant:
Inventors:

Prasad Yogendra Duggirala, Naperville, IL (US);

John David Morris, Plainfield, IL (US);

Peter Edward Reed, Plainfield, IL (US);

Steven John Severtson, Shoreview, MN (US);

Assignee:

Nalco Chemical Company, Naperville, IL (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 2/206 ; C08F / ;
U.S. Cl.
CPC ...
C08F 2/206 ; C08F / ;
Abstract

The present invention provides a novel class of polymer antiscalants which are polymers comprising a 1,2-dihydroxy-3-butene monomer unit and at least one monomer unit derived from the groups consisting of maleic acid, acrylic acid, acrylamide, methacrylic acid, itaconic acid, vinyl sulfonic acid, styrene sulfonic acid, N-tertbutylacrylamide, butoxymethylacrylamide, N,N-dimethylacrylamide, sodium acrylamidomethyl propane sulfonic acid, and salts thereof, with the proviso that said polymers do not contain the monomer unit —(CH,—CH═CH—CH,—O)—.


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