The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2001
Filed:
Oct. 27, 1998
UT-Battelle, Oak Ridge, TN (US);
Abstract
Molecular devices using functional Photosystem I reaction centers are prepared on flat derivatized substrate surfaces. The nature and extent of orientation are controlled by chemical modification of the surface derivative. The surface of the substrate is chemically modified such that the Photosystem I reaction centers may be immobilized in a desired orientation. Preferably, a sulfur-organic compound is used to chemically modify the surface of the substrate. Depending on the type of chemical modification, the orientation of the reaction centers may be parallel to the surface, perpendicular to the surface in the “up” position, or perpendicular to the surface in the “down” position. The different orientations provide different electrical characteristics to the device.