The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2001
Filed:
Dec. 10, 1997
Particle reagents having reduced matrix effects and containing an aldehyde-reactive functional group
Applicant:
Inventor:
Chengrong Wang, Hockessin, DE (US);
Assignee:
Dade Behring Inc., Deerfield, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 5/16 ;
U.S. Cl.
CPC ...
B32B 5/16 ;
Abstract
The invention is directed to the preparation of magnetic and non-magnetic particles coated with a polyaldehyde dextran material and a process for making the same. The polyaldehyde dextran coated particles of the invention are suitable for use in immunological assays and exhibit a reduced matrix effect in such assays when compared to convention particles without a polyaldehyde dextran coating.
Wang, Chengrong. (2001). Particle reagents having reduced matrix effects and containing an aldehyde-reactive functional group (U.S. Patent No. 6231982). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6231982
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile