The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 2001
Filed:
Feb. 19, 1999
NEC Corporation, Tokyo, JP;
Abstract
A polishing apparatus and method capable of polishing stably regardless of variation between polishing objects, change of a polishing means with lapse of time etc. The apparatus includes polishing pad,, polishing table,with the polishing pad,adhered thereto, table motor,for driving the polishing table,, conditioning means,for conditioning the polishing pad,at the same time of polishing and conditioning control system,for setting a conditioning condition during polishing. According to a polishing method of the present invention, a conditioning condition of the polishing pad,can be set so as to make a torque current,, which is proportional to a friction force exerted between the polishing pad,and the wafer,, constant, and thereby polishing speed can be stabilized.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile