The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2001
Filed:
Feb. 18, 1999
John C. Dries, Princeton, NJ (US);
Stephen R. Forrest, Princeton, NJ (US);
Milind Gokhale, Princeton, NJ (US);
The Trustees of Princeton University, Princeton, NJ (US);
Abstract
The use of highly compressively strained In,Ga,As quantum wells having a high In content for the detection of light to a wavelength of &lgr;≈2.1 &mgr;m is disclosed. Crystal quality is maintained through strain compensation using tensile strained barriers of InGaAs, InGaP, or InGaAsP. High efficiencies have been achieved in detectors fabricated using this technique. The theoretical cutoff wavelength limit for diodes fabricated using this technique is calculated to be &lgr;˜2.1 &mgr;m. Lattice mismatched layers may be used to transition between compressively strained layers and tensile strained layers to prevent the crystal from breaking up. Multiple quantum wells are formed with multiple periods of strained InGaAs, transition layers and tensile strained layers. These detectors have application in semiconductor, amplifiers, detectors, optical switches, images, etc.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile