The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 08, 2001

Filed:

Apr. 10, 2000
Applicant:
Inventors:

Jae Pil Kim, Suwon, KR;

Yong Joon Cheong, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 3/68 ; C23C 1/600 ;
U.S. Cl.
CPC ...
H05B 3/68 ; C23C 1/600 ;
Abstract

A wafer handling apparatus prevents polymers from sticking to the handler which conveys a wafer into/from a process chamber in which the wafer is treated. The wafer handler has an arm which is rotatably driven and an effector integral with the arm. The wafer is supported on the effector via a vacuum chuck formed by vacuum holes in the effector. The temperature of the handler is controlled to be identical to that inside the process chamber. The temperature controlling system has an electric heater for heating the effector and a current supplying apparatus which intermittently supplies current to the heater to maintain the temperature of the effector. Because the temperature of the handler is maintained at least as high as that inside the process chamber, polymers floating in the process chamber are prevented from sticking to the handler.


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