The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2001
Filed:
Jul. 06, 1999
Kazuya Kamon, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
The present invention is proposed to solve the problem of conspicuous increases in the drawing time of a circuit pattern when oblique lines are present which leads to high costs and low accuracy for resulting photomasks. For this reason, a shading pattern,formed on the principal plane of a transparent base,based on layout data of a circuit pattern of a polygon containing a oblique line is converted to polygon data in which a oblique line is expressed in a stepwise form by a number Np of rectangles which are defined by Np=int (W/Rp/m), where W is a width which is the width of the oblique lines, Rp is a resolution of a projection exposure apparatus and m is a magnification of a projection exposure apparatus. The shading pattern,is formed on the principal plane of the transparent substrate,based on layout data of a circuit pattern of a polygon containing a oblique line.