The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2001
Filed:
May. 04, 1999
Edward D. Nowak, Pleasanton, CA (US);
Subhas Bothra, San Jose, CA (US);
Philips Electronics North America Corp., New York, NY (US);
Abstract
Disclosed is an apparatus for generating mask data suitable to produce a support pillar mask used in air dielectric interconnect structures. The apparatus includes a mask data scanner configured to select features having an interconnect dimension from a first mask. The features having the interconnect dimension being defined to electrically interconnect devices distributed on a substrate. The apparatus further includes a mask data comparing engine for comparing mask data associated with an intermediate support pattern and mask data associated with the features having the interconnect dimension selected by the mask data scanner. The comparing being configured to identify a mask area where the intermediate support pattern and the features having the interconnect dimension overlap. Preferably, the identified mask area defines the location of a plurality of pillars.