The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2001
Filed:
Mar. 03, 1997
Francis Stace Murray Clube, Neuchatel, CH;
Holtronic Technologies Ltd., Marin, CH;
Abstract
The present invention relates to a method and an apparatus for holographically recording periodic or quasi-periodic features of a mask in a holographic recording layer. In holographic lithography the object beam is directed to the first substrate bearing a holographic recording layer such that it passes the mask substrate and interferes with a reference beam in the recording layer to form a hologram of the mask pattern. According to the new method the object beam is directed to the second substrate at an off-axis angle and the wavelength used and/or the angle of incidence of the object beam are selected according to the period of the features to be recorded such that essentially just the zero and one of the first diffraction orders are present for forming the hologram.