The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2001
Filed:
Aug. 18, 1998
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Abstract
A shadow mask is arranged to face an inner surface of a substantially rectangular face panel. The shadow mask has a substantially rectangular mask body which has a number of apertures for passing an electron beam, and a rectangular mask frame which supports a peripheral edge portion of the mask body. The mask body is curved in a short axis direction, and is fixed to the mask frame in a state that an internal stress of a direction making small a radius of curvature of the short axis direction is applied. The shadow mask is manufactured in a manner that a rectangular flat mask is-plastically deformed so as to prepare the mask body having a curved surface such that a relation between a radius of curvature Rc of the short axis direction in the vicinity of the long axis and a radius of curvature Ra of the short axis direction in the vicinity of a long side becomes Rc<Ra, and thereafter, the mask body is fixed to the mask frame in a state of being elastically deformed in a direction in which a radius of curvature of the short axis direction becomes large.