The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2001

Filed:

Jan. 27, 1998
Applicant:
Inventors:

Takehisa Yamaguchi, Nishigoshi-machi, JP;

Akio Nakayama, Nishigoshi-machi, JP;

Assignee:

Advanced Display Inc., Kumamoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/904 ; H01L 3/1036 ; H01L 3/10376 ; H01L 3/120 ;
U.S. Cl.
CPC ...
H01L 2/904 ; H01L 3/1036 ; H01L 3/10376 ; H01L 3/120 ;
Abstract

A TFT of the present invention includes an insulating substrate, a first conductive film layer which is to be a gate electrode provided on the insulating substrate, a first insulating film layer which is to be a gate insulating film layer provided on the first conductive film layer, a non-doped semiconductor layer formed on the first insulating film layer, and a second conductive film layer which is to be a source electrode formed on a source region of the semiconductor layer and a drain electrode formed on a drain region of the semiconductor, wherein a junction is formed by implanting an n-type impurity in the source region of the semiconductor layer and the drain region of the semiconductor.


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