The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2001
Filed:
Oct. 16, 1998
Duane P. Littlejohn, Manlius, NY (US);
Robert W. Arnold, Johnson City, NY (US);
Siemens Aktiengesellschaft, Munich, DE;
Abstract
During operation of a FTICR MS the time after the opening of the pulsed valve sample gas inlet system that the peak of sample gas pressure occurs in the vacuum chamber is determined by measuring the amplitude of the ion pump current. The FTICR MS then uses that time and the known period of time for which a source of electrons used for an ionization event is energized to energize the electron source so that the known period of time includes the peak of vacuum chamber sample gas pressure. This allows ions to be created during the peak of the sample gas pressure to thereby obtain the maximum sensitivity during measurements.