The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2001

Filed:

Jul. 12, 1996
Applicant:
Inventors:

Shigeyoshi Nozawa, Osaka, JP;

Shinji Tomita, Hyogo-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract

A CVD device A is provided which is equipped with a gas introduction part A,having an inert gas supply part G,for supplying a diluting inert gas and a cleaning gas supply path G,for supplying a cleaning gas, each connected therewith, and equipped with an exhaust gas discharge part A,for releasing an exhaust gas; an exhaust gas circulation part D,for circulating an exhaust gas from the CVD device, a cooling part D,for cooling down and liquefying the cleaning gas in the exhaust gas, and a recovery part,for recovering the cleaning gas liquefied in said cooling part D,the diluting inert gas is composed of a gas having a boiling point lower than that of the cleaning gas; a supply part,for supplying a cooling inert gas having the same composition as the diluting inert gas in a liquid state, an inert gas circulation part D,which is cooled down by heat of evaporation of the cooling inert gas, and an inert gas discharge part,for discharging the cooling inert gas evaporated in the inert gas circulation part D,are provided, constituting the cooling part D,and the inert gas discharge part,is connected to the inert gas supply path G


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