The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 2001

Filed:

Feb. 21, 1997
Applicant:
Inventors:

Gerald Pham-Van-Diep, Newport Beach, CA (US);

E. Philip Muntz, Pasadena, CA (US);

Hal Watts, Holden, MA (US);

William Johnson, Franklin, MA (US);

Melvin Main, Hanover, PA (US);

Robert F. Smith, Costa Mesa, CA (US);

Melissa E. Ormé-Marmarelis, Irvine, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B41J 3/00 ;
U.S. Cl.
CPC ...
B41J 3/00 ;
Abstract

Continuous jetting of liquid metal droplets for deposit on a substrate includes an ejector, a deflection device, a print chute, and a collection reservoir. Liquid metal from a cartridge in the ejector provides a continuous molten material stream through an orifice-defining structure while a vibration device creates a standing wave in the stream to break the molten material stream into individual droplets which receive charge from a charging device. The deflection device enables the positioning of the charged droplets to be controlled for placement on a substrate. Control systems assist in the calibration and control of the continuous stream to ensure that selected droplets are placed at desired locations on the substrate.


Find Patent Forward Citations

Loading…