The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2001
Filed:
Feb. 22, 1999
Shinji Okamoto, Yawata, JP;
Matsushita Electric Works, Ltd., Osaka, JP;
Abstract
A pattern inspection method capable of providing an improved inspection reliability includes the following steps. A pattern classification is set every pixel-value range of a reference-image data obtained from a reference pattern. Each of the pattern classifications has reference-data preparing parameters. With respect to each pixel of the reference-image data, pixel values of a pixel window which is composed of the pixel as a center pixel and neighbor pixels around the center pixel are checked to prepare a reference data. When all of the pixels in the pixel window are within a single pixel-value range, the center pixel is decided as a pattern uniform portion, and the reference data is prepared according to the parameters of a corresponding pattern classification. When all of the pixels in the pixel window are not within the single pixel-value range, the center pixel is decided as a pattern step portion, and internal and external pattern classifications are determined, so that the reference data is prepared according to the parameters of at least one of the internal and external pattern classifications. An inspection-image data of a pattern to be inspected is compared with the reference data to detect a defect of the pattern.