The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2001
Filed:
Dec. 05, 1997
Toshiya Ohtomo, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
In an exposure apparatus for projecting a mask pattern of a mask onto a photosensitive substrate, provided are a substrate stage which is two-dimensionally movable along an upper surface of a substrate base while carrying the photosensitive substrate thereon; substrate stage cable-relaying means which is disposed so as to be physically separated from the substrate base surface, secures thereto a cable connected to the substrate stage, and is movable in the same two-dimensional directions as those of the substrate stage; and substrate stage driving means to control an amount of movement of the substrate stage cable-relaying means such that relative positions of the substrate stage and cable-relaying means with respect to each other are always kept constant. Further, a reticle stage is similarly provided with reticle stage cable-relaying means which two-dimensionally moves so as to follow the reticle stage.