The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2001

Filed:

Apr. 17, 1998
Applicant:
Inventors:

William A. Langille, Amherst, NH (US);

Lee A. Batchelder, Derry, NH (US);

Eitan Chaim Zeira, Nashua, NH (US);

Christopher Alan Barnett, Lechlade, GB;

Joseph S. Formosa, Hopedale, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 2/600 ;
U.S. Cl.
CPC ...
B23K 2/600 ;
Abstract

Apparatus for continuously micro-embossing a seamless precision optical pattern onto a moving substrate without the use of an intermediate layer, comprising an energy source, such as a laser, along with reduction optics, a mask and a moving substrate. The moving substrate provides both precision linear and rotational movement which motion is coupled with the laser projection imaging episode. Etched patterns can therefor be continuously and precisely ablated in the substrate to substantially cover the entire surface to uniquely micro-emboss therein a seamless precision optical image.


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