The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2001

Filed:

Oct. 28, 1999
Applicant:
Inventors:

Dean R. Lagerwall, Amherst, NY (US);

Pravin M. Khandare, Amherst, NY (US);

Hang-Chang Bobby Chen, Amherst, NY (US);

Mark F. Lechner, Sanborn, NY (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 1/700 ;
U.S. Cl.
CPC ...
C07C 1/700 ;
Abstract

Disclosed is a method of increasing the percentage of certain isomers made when di or tri-substituted benzenes are chlorinated in the presence of a Friedel-Crafts catalyst. The use of about 0.001 to about 1 wt % a cocatalyst during chlorination alters the isomeric ratio of the product mixture. In particular, the percentage of the 2,5-isomer is increased when said substituted benzene is ortho or meta-substituted, the percentage of the 3,4-isomer is increased when said substituted benzene is para-substituted, and the percentage of the 2,4,5-isomer is increased when said substituted benzene is 2,4-disubstituted, 3,4-disubstituted, or 2,5-disubstituted.


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