The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2001
Filed:
Dec. 15, 1998
Applicant:
Inventors:
David W. Keck, Butte, MT (US);
Ronald O. Russell, Anaconda, MT (US);
Howard J. Dawson, Moses Lake, WA (US);
Assignee:
Advanced Silicon Materials, LLC, Moses Lake, WA (US);
Primary Examiner:
Int. Cl.
CPC ...
C30B 3/500 ;
U.S. Cl.
CPC ...
C30B 3/500 ;
Abstract
Disclosed are processes and reactor apparatus for rapidly producing large diameter, high-purity polycrystalline silicon rods for semiconductor applications. A.C. current is provided to the rods by a power supply, having a fixed or variable high frequency in the range of about 2 kHz to 800 kHz, to concentrate at least 70% of the current in an annular region that is the outer 15% of a rod due to the “skin effect.”